Laser‐induced chemical vapor deposition of SiO2
نویسندگان
چکیده
منابع مشابه
SiO2 coating of silver nanoparticles by photoinduced chemical vapor deposition.
Gas-phase silver nanoparticles were coated with silicon dioxide (SiO2) by photoinduced chemical vapor deposition (photo-CVD). Silver nanoparticles, produced by inert gas condensation, and a SiO2 precursor, tetraethylorthosilicate (TEOS), were exposed to vacuum ultraviolet (VUV) radiation at atmospheric pressure and varying temperatures. The VUV photons dissociate the TEOS precursor, initiating ...
متن کاملSpatially controllable chemical vapor deposition
Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...
متن کاملLasing of CdSe/SiO2 nanocables synthesized by the facile chemical vapor deposition method.
Semiconductor nanocables are good candidates for developing robust and environmental stable nanolasers. In this work, high-quality CdSe/SiO(2) nanocables were synthesized by the facile chemical vapor deposition method. The as-synthesized nanocables were characterized by scanning electron microscopy, high-resolution transmission electron microscopy, and energy-dispersive X-ray spectroscopy. The ...
متن کاملPlasmon-assisted chemical vapor deposition.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...
متن کاملPlasma enhanced chemical vapor deposition of SiO2 using novel alkoxysilane precursors
Articles you may be interested in Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry Determination of the mechanical stress in plasma enhanced ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 1982
ISSN: 0003-6951,1077-3118
DOI: 10.1063/1.93202